Display panel, mask, method for manufacturing display panel, and display device

ABSTRACT

The present invention provides a mask, a display panel, a method for manufacturing a display panel, and a display device. The display panel has a hollow region and a display region surrounding the hollow region. The display panel includes a plurality of organic light-emitting devices arranged only in the display region. Each of the plurality of organic light-emitting devices includes an anode layer, a cathode layer, a light-emitting layer and a functional layer. The functional layer includes a plurality of uneven portions.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a divisional application of U.S. Ser. No.16/266,068, filed Feb. 3, 2019, which claims priority to Chinese PatentApplication No. 201810996167.6, filed on Aug. 29, 2018; the content ofthese applications is incorporated herein by reference in its entirety.

FIELD

The present disclosure relates to the field of display technologies, andin particular, relates to a display panel, a mask, a method formanufacturing a display panel, and a display device.

BACKGROUND

With the development of display technologies and diversifiedrequirements of users for display devices, a special-shaped displayerhaving an aperture arranged in the middle has gained more and moreattention.

However, for an OLED displayer, since functional film layers such as anelectron transport layer and an electron injection layer are formed byvapor deposition, it is needed to avoid the area where the aperture islocated for all film layers when manufacturing the special-shaped OLEDdisplayer. This increases the manufacturing difficulty.

SUMMARY

In view of this, the present disclosure provides a mask, a displaypanel, a method for manufacturing a display panel, and a display device,aiming to solve the problem of the big difficulty in manufacturing aspecial-shaped OLED display having aperture arranged in the middleposition in the related art.

In an aspect, the present disclosure provides a display panel. Thedisplay panel has a hollow region and a display region surrounding thehollow region. The display panel includes: a plurality of organiclight-emitting devices, the plurality of organic light-emitting devicesbeing arranged only in the display region rather than in the hollowregion. Each of the plurality of organic light-emitting devices includesan anode layer, a cathode layer, a light-emitting layer and a functionallayer. The functional layer includes a plurality of uneven portions.

In another aspect, the present disclosure provides a method formanufacturing a display panel. The method includes: providing asubstrate and at least one mask, and the substrate has a first regionand a second region, a projection of the first region on a plane of thesubstrate does not overlap with a projection of the second region on theplane of the substrate, the first region and the second region eachextend from an edge of the substrate into the substrate, each of the atleast one mask includes an aperture portion and at least one shieldingportion, and the at least one shielding portion extends from an edge ofthe mask into the mask; and forming a functional layer on a side of thesubstrate sequentially by vapor deposition through the aperture portionof the at least one mask, and the functional layer includes a firstfunctional portion, a second functional portion, and an uneven portion,and the first functional portion and the second functional portion arerespectively located on two sides of the uneven portion. The firstfunctional portion covers the second region, the second functionalportion covers the first region, and the first functional portion andthe second functional portion are arranged in a same layer.

In still another aspect, the present disclosure provides a mask. Themask includes an aperture portion and a shielding portion, and theshieling portion extends inward from an edge of the mask.

In yet still another aspect, the present disclosure provides a displaydevice. The display device includes the abovementioned display panel.

BRIEF DESCRIPTION OF DRAWINGS

Embodiments of the present disclosure are described in the accompanyingdrawings. It should be noted that the drawings described as follows aremerely part of the embodiments of the present disclosure.

FIG. 1 is a schematic diagram illustrating a shape of a special-shapeddisplayer having an aperture arranged in the middle in the related art;

FIG. 2 is a schematic diagram of a mask in the related art;

FIG. 3 is a top view of a display panel according to an embodiment ofthe present disclosure;

FIG. 4 is a schematic cross-sectional view along AN of FIG. 3;

FIG. 5 is a schematic diagram of a mask according to an embodiment ofthe present disclosure;

FIG. 6 is a cross-sectional view of another display panel according toan embodiment of the present disclosure;

FIG. 7 is a top view of another display panel according to an embodimentof the present disclosure;

FIG. 8 is a schematic diagram of another mask according to an embodimentof the present disclosure;

FIG. 9 is a top view of still another display panel according to anembodiment of the present disclosure;

FIG. 10 is a top view of yet still another display panel according to anembodiment of the present disclosure;

FIG. 11 is a top view of yet still another display panel according to anembodiment of the present disclosure;

FIG. 12 is a cross-sectional view along BB′ of FIG. 3;

FIG. 13 is a schematic flowchart of a method for manufacturing a displaypanel according to an embodiment of the present disclosure;

FIG. 14 is a schematic structural flowchart of the method of FIG. 13;

FIG. 15 is a schematic flowchart of another method for manufacturing adisplay panel according to an embodiment of the present disclosure;

FIG. 16 is a schematic diagram of yet still another mask according to anembodiment of the present disclosure;

FIG. 17 is a schematic structural flowchart of another method formanufacturing a display panel according to an embodiment of the presentdisclosure;

FIG. 18 is a schematic diagram of adjusting a position of a first maskrelative to a substrate according to an embodiment of the presentdisclosure;

FIG. 19 is another schematic diagram of a first mask according to anembodiment of the present disclosure;

FIG. 20 is a schematic structural flowchart of still another method formanufacturing a display panel according to an embodiment of the presentdisclosure;

FIG. 21 is a schematic diagram of yet still another mask according to anembodiment of the present disclosure;

FIG. 22 is a schematic structural flowchart of yet still another methodfor manufacturing a display panel according to an embodiment of thepresent disclosure;

FIG. 23 is a schematic flowchart of still another method for fabricatinga display panel according to an embodiment of the present disclosure;

FIG. 24 is a schematic structural flowchart of the method of FIG. 23;

FIG. 25 is a perspective view of another display panel according to anembodiment of the present disclosure; and

FIG. 26 is a schematic diagram of a display device according to anembodiment of the present disclosure.

DESCRIPTION OF EMBODIMENTS

The terms used in the embodiments of the present disclosure are merelyfor the purpose of describing particular embodiments but not intended tolimit the present disclosure. Unless otherwise noted in the context, thesingular form expressions “a”, “an”, “the” and “said” used in theembodiments and appended claims of the present disclosure are alsointended to represent plural form expressions thereof.

It should be understood that the term “and/or” used herein is merely anassociation relationship describing associated objects, indicating thatthere may be three relationships, for example, A and/or B may indicatethat three cases, i.e., A existing individually, A and B existingsimultaneously, B existing individually. In addition, the character “I”herein generally indicates that the related objects before and after thecharacter form an “or” relationship.

It should be understood that although a mask may be described using theterms of “first”, “second”, etc., in the embodiments of the presentdisclosure, the mask will not be limited to these terms. These terms aremerely used to distinguish masks from one another. For example, withoutdeparting from the scope of the embodiments of the present disclosure, afirst mask may also be referred to as a second mask, and similarly, asecond mask may also be referred to as a first mask.

FIG. 1 is a schematic diagram illustrating a shape of a special-shapeddisplayer having an aperture arranged in the middle in the related art.With the development of display technologies and diversifiedrequirements of users for display devices, the special-shaped displayeras shown in FIG. 1 has gained more and more attention.

However, for an OLED displayer, since functional film layers such as anelectron transport layer and an electron injection layer are formed byvapor deposition, it is needed to avoid the area where the aperture islocated for all film layers when manufacturing the special-shaped OLEDdisplayer. This increases the manufacturing difficulty.

At present, the special-shaped OLED display panel as shown in FIG. 1 isgenerally manufactured by following methods.

In a first method, a mask as shown in FIG. 2 is used. FIG. 2 is aschematic diagram of a mask in the related art. The mask 2′ includes abaffle 21′ for shielding the middle aperture region of thespecial-shaped display panel. The mask 2′ further includes a supportpillar 22′ for supporting the baffle 21′. When the special-shapeddisplay panel shown in FIG. 1 is manufactured by using the mask 2′, apart of the display panel corresponding to the support pillar 22′ cannotbe vapor-deposited due to the existence of the support pillar 22′, whichwould have an influence on displaying of the display panel.

In a second method, the aperture region 1′ in the middle of thespecial-shaped display panel is first ignored, and then film layersincluding an electron transport layer, an electron injection layer andthe like functional film layer are manufactured without an aperture.Then, the respective film layers located at the aperture region 1′ areremoved so as to form a shape as shown in FIG. 1. However, whenmanufacturing is carried out by this method, material residues willunavoidably remain when the film layers located at the aperture region1′ are removed, and may affect the subsequent packaging process of thedisplay panel.

In view of this, an embodiment of the present disclosure provides adisplay panel. FIG. 3 is a top view of a display panel according to anembodiment of the present disclosure. As shown in FIG. 3, the displaypanel includes a hollow region 20 and a display region 10 surroundingthe hollow region 20. A plurality of organic light-emitting devices 11is provided in the display region 10, and no organic light-emittingdevice 11 is provided in the hollow region 20.

FIG. 4 is a schematic cross-sectional view along AA′ of FIG. 3. As shownin FIG. 3 and FIG. 4, the organic light-emitting device 11 includes ananode layer 111, a cathode layer 112, a light-emitting layer 113, and afunctional layer 114. The functional layer 114 includes a plurality ofuneven portions 1140.

In this embodiment of the present disclosure, by setting the unevenportions 1140 in the functional layer 114 included in the display panel,the display region 10 of the display panel can be divided into at leasttwo parts when manufacturing the display panel. Here, each part of thedivided display region 10 extends from an edge of the display panel intothe display panel. Then, a first mask and a second mask as shown in FIG.5 are used to form the functional layer 114 covering the entire displayregion 10 by at least two vapor deposition processes. FIG. 5 is aschematic diagram of a mask according to an embodiment of the presentdisclosure. Here, patterns of the first mask 301 and the second mask 302are in one-to-one correspondence with respective shapes of the pluralityof parts into which the display region 10 is divided, that is, shieldingportions of the first mask 301 and the second mask 302 each extend fromthe edge into the first mask 301 and the second mask 302. In this way,when manufacturing the display panel including the hollow region 20, itis not necessary to perform cutting and the like operation on the hollowregion 20 of the display panel. As a result, cutting residues can beavoided, and thus reliable packaging of the display panel can beachieved. Moreover, since the shielding portions of the first mask andthe second mask each extend from the edge of first mask 301 and thesecond mask 302 into the first mask 301 and the second mask 302, thereis no need to additionally provide a support pillar for the first maskand the second mask to support the shielding portions. In this way, theinfluence on vapor deposition of the display region 10 can be avoided,and the problem that the position other than the hollow region 20 cannotbe vapor-deposited can be avoided, thereby improving the display effectof the display panel.

In an example, as shown in FIG. 3 and FIG. 4, the uneven portions 1140do not overlap with the light-emitting layer 113. By setting that theuneven portions do not overlap with the light-emitting layer, i.e., bysetting the boundaries that divide the display region 10 into aplurality of parts to not overlap with the light-emitting layer 113, thepresent disclosure can avoid the influence on the light-emitting layer113 emitting light, such that the light-emitting layer 113 can normallyemit light, thereby achieving the display effect of the display panelincluding the hollow region 20 provided by this embodiment of thepresent disclosure.

It should be noted that the position relation between the functionallayer 114 and the light-emitting layer 113 shown in FIG. 4 is merelyillustrative, and in the actual designing and manufacturing process ofdisplay panel, the functional layer 114 may be arranged at a differentposition depending on a different function of the functional layer 114in the display panel. For example, when the functional layer 114 is abuffer layer, a hole transport layer, or a hole injection layer, thefunctional layer 114 may be disposed between the anode layer 111 and thelight-emitting layer 113 so as to improve injection and transportefficiency of holes. When the functional layer 114 is an electroninjection layer or an electron transport layer, the functional layer 114may be disposed between the cathode layer 112 and the light-emittinglayer 113 so as to improve injection and transport efficiency ofelectrons. In an embodiment of the present disclosure, the functionallayer 114 may include the buffer layer, the hole transport layer, thehole injection layer, the electron transport layer, and the electroninjection layer at the same time, which is not limited herein. When thedisplay panel provided by this embodiment of the present disclosureincludes the buffer layer, the hole transport layer, the hole injectionlayer, the electron transport layer and the electron injection layer atthe same time, the anode, the buffer layer, the hole injection layer,the hole transport layer, the light-emitting layer, the electrontransport layer, the electron injection layer, and the cathode arestacked sequentially along a normal direction of the display panel.Here, the buffer layer is used to match an energy level differencebetween the anode and the hole injection layer, thereby improvinginjection and transport efficiency of holes. The buffer layer usuallyhas a film thickness of approximately 300 Å.

In an embodiment, there are various forms for the above uneven portion1140. For example, as shown in FIG. 4, the uneven portions 1140 includea protrusion 11401, and the protrusion 11401 does not overlap with thelight-emitting layer 113.

In another example, as shown in FIG. 6, which is a cross-sectional viewof another display panel according to an embodiment of the presentdisclosure, the uneven portions 1140 include a recess 11402, and therecess 11402 does not overlap with the light-emitting layer 113. It canbe understood that the recess 11402 shown in FIG. 6 is in a state ofbeing filled up by the cathode layer 112 formed above the functionallayer 114.

In another example, for two uneven portions 1140 separated by the hollowregion 20 as shown in FIG. 3, one uneven portion 1140 located on a sideof the hollow region 20 is a protrusion 11401, and the other unevenportion 1140 located on the other side of the hollow region 20 is arecess 11402. Neither the protrusion 11401 or the recess 11402 overlapswith the light-emitting layer 113.

In an example, as shown in FIG. 4 and FIG. 6, the display region 10 ofthe abovementioned display panel further includes a pixel definitionlayer 12, and the pixel definition layer 12 includes a plurality ofvalleys 121 and a plurality of ridges 122. The functional layer 114covers the valleys 121 and ridges 122 of the pixel definition layer 12.The light-emitting layer 113 is arranged only at the valleys 121 of thepixel definition layer 12, and the recess 11402 and the protrusion 11401are arranged only at the ridges 122 of the pixel definition layer, so asto avoid the influence of the recess 11402 and the protrusion 11401 onlight emitting of the light-emitting layer 113. This can allow thelight-emitting layer 113 to emit light normally.

In an embodiment, as shown in FIG. 3, the display region 10 of theabovementioned display panel further includes a plurality of scan lines13 and data lines 14. The scan lines 13 or the data lines 14 overlapwith the convex portion 11401, and the scan lines 13 or the data lines14 overlap with the recess 11402, so as to prevent the convex portion11401 and the recess 11402 from overlapping with the organiclight-emitting device 11, thereby achieving normal display of theorganic light-emitting device 11.

In an embodiment, as shown in FIG. 3, FIG. 4 and FIG. 6, in a planeparallel to the display panel, along a direction of a shorter edge ofthe uneven portion 1140, a width d of the uneven portion 1140 satisfies0.005μm≤d≤0.35 μm, and is smaller than a size of the support pillar 22′of the mask 2′ shown in FIG. 2. This can avoid the influence on normaldisplay of the display panel due to the excessive width of the unevenportion 1140.

In an example, as shown in FIG. 3, an extension line of theabovementioned uneven portion 1140 passes through a geometric center 200of the hollow region 20. That is, when manufacturing the display panel,the display region 10 of the display panel can be divided into at leasttwo parts by any straight line passing through the geometry center 200of the hollow region 20 in such a manner that each part of the displayregion 10 extends from an edge of the display panel to inside of thedisplay panel. Then, the functional layer 114 covering the entiredisplay region 10 is manufacture using a mask by at least two vapordeposition processes. Correspondingly, as shown in FIG. 5, the shieldingportion of the used first mask 301 and the shielding portion of the usedsecond mask 302 can extend from respective edges of the first mask 301and the second mask 302 to inside. In this way, when manufacturing thedisplay panel including the hollow region 20, it is not necessary toperform cutting and the like operation on the hollow region 20 of thedisplay panel. As a result, cutting residues can be avoided, and thusreliable packaging of the display panel can be achieved. Moreover, sincethe shielding portions of the first mask and the second mask extend fromthe respective edges of the first mask 301 and the second mask 302 intothe first mask 301 and the second mask 302, there is no need toadditionally provide a support pillar for the masks to support theshielding portions. In this way, the influence on vapor deposition ofthe display region 10 can be avoided, and the problem that the positionother than the hollow region 20 cannot be vapor-deposited can beavoided.

In an embodiment, as shown in FIG. 7, which is a schematic diagram ofanother display panel according to an embodiment of the presentdisclosure, an extension line of the uneven portion 1140 coincides withan edge of the hollow region 20. That is, when manufacturing the displaypanel, the display region 10 of the display panel can be vapor-depositedat least twice by using the first mask 301 and the second mask 302 asshown in FIG. 8, which is a schematic diagram of another mask accordingto an embodiment of the present disclosure. In this way, it can alsoachieve that each portion into which the display region 10 is dividedextends from the edge of the display panel into the display panel. Then,the functional layer 114 covering the entire display region 10 ismanufactured using the mask as shown in FIG. 8 by at least two vapordeposition processes. Correspondingly, the shielding portion of the usedfirst mask 301 and the shielding portion of the used second mask 302 canextend from respective edges of the first mask 301 and the second mask302 into the first mask 301 and the second mask 302. In this way, whenmanufacturing the display panel including the hollow region 20, it isnot necessary to perform cutting and the like operation on the hollowregion 20 of the display panel. Moreover, since the respective shieldingportions of the first mask 301 and the second mask 302 extend from therespective edges of the first mask 301 and the second mask 302 into thefirst mask 301 and the second mask 302, there is no need to additionallyprovide a support pillar for the masks to support the shieldingportions. In this way, the influence on vapor deposition of the displayregion 10 can be avoided, and the problem that the position other thanthe hollow region 20 cannot be vapor-deposited can be avoided.

In an example, one or more hollow regions 20 may be provided. As shownin FIG. 9, which is a top view of still another display panel accordingto an embodiment of the present disclosure, two hollow regions 20 areprovided.

In an example, the hollow region 20 and an outer contour of the displayregion 10 may be shaped as any closed patterns. For example, as shown inFIG. 3, both the outer contour of the display region 10 and the hollowregion 20 are shaped as quadrangles. As shown in FIG. 10, which is a topview of yet still another display panel according to an embodiment ofthe present disclosure, both the outer contour of the display region 10and the hollow region 20 are shaped as circles. As shown in FIG. 11,which is a top view of yet still another display panel according to anembodiment of the present disclosure, the outer contour of the displayregion 10 is a shaped as a circle and the hollow region 20 is shaped asa quadrangle. This can be set depending on actual needs, and the presentdisclosure makes no limitation on this.

For example, as shown in FIG. 4 and FIG. 6, a substrate 15 is furtherprovided in the display region 10 of the display panel. In anotherembodiment, as shown in FIG. 12, which is a cross-sectional view alongBB′ of FIG. 3, no substrate is provided in the hollow region 20. Whenmanufacturing the display device such as a watch, a pointer can beplaced in the hollow region 20.

An embodiment of the present disclosure further provides a method formanufacturing a display panel. FIG. 13 is a schematic flowchart of amethod for manufacturing a display panel according to an embodiment ofthe present disclosure, and FIG. 14 is a schematic structural flowchartof the method of FIG. 13. As shown in FIG. 13 and FIG. 14, the methodincludes steps as follows.

At S1, a substrate 15 and a mask are provided. The substrate 15 includesa first region 151 and a second region 152, and a projection of thefirst region 151 on a plane of the substrate 15 does not overlap with aprojection of the second region 152 on the plane of the substrate 15.The first region 151 and the second region 152 each extend from the edgeof the substrate 15 into the substrate 15. The mask includes an apertureportion and a shielding portion, and the shielding portion extends fromthe edge of the mask into the mask.

At S2, a functional layer 114 is formed on a side of the substratesequentially by vapor deposition through the aperture portion of themask. As shown in FIG. 14, the functional layer 114 includes a firstfunctional portion 1141, a second functional portion 1142, and an unevenportion 1140. The first functional portion 1141 and the secondfunctional portion 1142 are respectively located on two sides of theuneven portion 1140. The first functional portion 1141 covers the secondregion 152. The second functional portion 1142 covers the first region151. The first functional portion 1141 and the second functional portion1142 are arranged in a same layer.

In the method for manufacturing the display panel provided by thisembodiment of the present disclosure, the substrate 15 includes thefirst region 151 and the second region 152, and the projection of thefirst region 151 on the plane of the substrate 15 does not overlap withthe projection of the second region 152 on the plane of the substrate15. Moreover, the first region 151 and the second region 152 each extendfrom the edge of the substrate 15 into the substrate 15. Then, masks areused, and the functional layer 114 including the first functionalportion 1141, the second functional portion 1142 and the uneven portion1140 are formed on the side of the substrate 15 sequentially by vapordeposition through the aperture portion of the masks. Here, the patternsof the masks are in one-to-one correspondence with the respective shapesof the first region and the second region of the substrate 15, that is,the shielding portion of each mask extends from the edge of the maskinto the mask. In this way, when manufacturing a display panel that isbendable or includes a hollow region, since the shielding portion ofeach mask extends from the edge of the mask into the mask, there is noneed to additionally provide a support pillar for the mask to supportthe shielding portion. In this way, the influence on vapor deposition ofthe substrate 15 can be avoided, and the problem that some region cannotbe vapor-deposited can be avoided, thereby improving the display effectof the manufactured display panel.

In an example, as shown in FIG. 14, the abovementioned substrate 15 hasa hollow region 20 and a through hole 150 is provided in the hollowregion 20, and the first functional portion 1141 and/or the secondfunctional portion 1142 are not formed at the through hole 150.

FIG. 15 is a schematic flowchart of another method for manufacturing adisplay panel according to an embodiment of the present disclosure. Inan example, as in FIG. 5, FIG. 14 and FIG. 15, the above mask includes afirst mask 301 and a second mask 302. The first mask 301 includes anaperture portion 31 a and shielding portions 32 a, and the shieldingportions 32 a include a first shielding portion 321 a and a secondshielding portion 322 a that is connected to the first shielding portion321 a. The second mask 302 includes an aperture portion 31 b andshielding portions 32 b, and the shielding portions 32 b includes afirst shielding portion 321 b and a second shielding portion 322 b thatis connected to the first shielding portion 321 b. The first shieldingportion 321 a of the first mask 301 and the first shielding portion 321b of the second mask 302 each have a same shape and a same area as thethrough hole 150. The second shielding portion 322 a of the first mask301 extends from the edge of the first mask 301 into the first mask 301,and the second shielding portion 322 b of the second mask 302 extendsfrom the edge of the second mask 302 into the second mask 302.

The abovementioned step S2 of forming the first functional portion 1141and the second functional portion 1152 on the side of the substrate 15sequentially by vapor deposition through the aperture portions of themasks includes the following steps.

At S21, the through hole 150 of the substrate 15 is covered using thefirst shielding portion 321 a of the first mask 301, the first region151 of the substrate 15 is covered using the second shielding portion322 a of the first mask 301, and the second region 152 of the substrate15 is exposed from the aperture portion 31 a of the first mask 301.

At S22, the first functional portion 1141 is formed on the side of thesubstrate 15 by vapor deposition through the aperture portion 31 a ofthe first mask 301.

At S23, the through hole 150 of the substrate 15 is covered using thefirst shielding portion 321 b of the second mask 302, the second region152 of the substrate 15 is covered using the second shielding portion322 b of the second mask 302, and the first region 151 of the substrate15 is exposed from the aperture portion 31 b of the second mask 302.

At S24, the second functional portion 1142 is formed on the side of thesubstrate 15 by vapor deposition through the aperture portion 31 b ofthe second mask 302.

FIG. 16 is a schematic diagram of yet still another mask according to anembodiment of the present disclosure, and FIG. 17 is a schematicstructural flowchart of another method for manufacturing a display panelaccording to an embodiment of the present disclosure. In an example, asshown in FIG. 16 and FIG. 17, both the through hole 150 and an outercontour of the substrate 15 are shaped as central symmetrical patterns,and a symmetry center of the through hole 150 coincides with a symmetrycenter of the substrate 15. The second shielding portion 322 a of thefirst mask 301 has a same shape as the aperture portion 31 b of thesecond mask 302, and the aperture portion 31 a of the first mask 301 hasa same shape as the second shielding portion 322 b of the second mask302.

The abovementioned step S23 of covering the through hole 150 of thesubstrate 15 using the first shielding portion 321 b of the second mask302, covering the second region 152 of the substrate 15 using the secondshielding portion 322 b of the second mask 302 and exposing the firstregion 151 of the substrate 15 from the aperture portion 31 b of thesecond mask 302 includes: adjusting a position of the first mask 301relative to the substrate 15 in such a manner that the first shieldingportion 321 a of the first mask 301 covers the through hole 150 of thesubstrate 15, the second shielding portion 322 a of the first mask 301covers the second region 152 of the substrate 15, and the apertureportion 31 a of the first mask 301 exposes the first region 151 of thesubstrate 15.

The abovementioned step S24 of forming the second functional portion1142 on the side of the substrate 15 by vapor deposition through theaperture portion 31 b of the second mask 302 includes: forming thesecond functional portion 1142 on the side of the substrate 15 by vapordeposition through the aperture portion 31 a of the first mask 301having its position adjusted.

That is, in this embodiment of the present disclosure, in a case wherethe through hole 150 and an outer contour of the substrate 15 are shapedas central symmetrical patterns and the symmetry center of the throughhole 150 coincides with the symmetry center of the substrate 15, thefirst mask 301 can be used as the second mask 302 by only adjusting theposition of the first mask 301. In this way, the functional layer 114can be formed by performing vapor deposition twice through a mask ofonly one pattern, thereby reducing masks and thus reducing themanufacturing cost of the abovementioned display panel.

For example, the abovementioned step of adjusting the position of thefirst mask 301 relative to the substrate 15 includes: fixing the firstmask 301 and rotating the substrate 15 by 180° about the symmetry centerof the substrate 15, or fixing the substrate 15 and rotating the firstmask 301 by 180° about the symmetry center of the substrate 15. Forexample, as shown in FIG. 18, which is a schematic diagram of adjustinga position of the first mask 301 relative to the substrate 15 accordingto an embodiment of the present disclosure, the substrate 15 is fixedand the first mask 301 is rotated about the symmetry center of thesubstrate 15.

In an example, the through hole 150 and the outer contour of thesubstrate 15 each can be shaped as a circle or equilateral, and thegeometric center of the through hole 150 coincides with the geometriccenter of the substrate 15. As shown in FIG. 19, which is anotherschematic diagram of the first mask according to an embodiment of thepresent disclosure, the second shielding portion 322 a of the first mask301 includes at least two second shielding sub-portions 3221 a, and theaperture portion 31 a of the first mask 301 includes at least twoaperture sub-portions 311 a. A number of the aperture sub-portions 311 ais equal to a number of the second shielding sub-portions 3221 a. Thesecond shielding sub-portions 3221 a and the aperture sub-portions 311 aare alternately arranged. Each second shielding sub-portion 3221 a ofthe first mask 301 extends from the edge of the first mask 301 into thefirst mask 301.

FIG. 20 is a schematic structural flowchart of still another method formanufacturing a display panel according to an embodiment of the presentdisclosure. As shown in FIG. 20, the first region 151 of the substrate15 includes at least two first sub-regions 1511, and the second region152 of the substrate 15 includes at least two second sub-regions 1521. Anumber of the first sub-regions 1511 is equal to a number of the secondsub-regions 1521. The number of the first sub-regions 1511 is equal to anumber of the aperture sub-portions 311. The first sub-regions 1511 andthe second sub-regions 1521 are alternately arranged. The firstfunctional portion 1141 includes at least two first function sub-layers11411, and a number of the first functional sub-layers 11411 is equal tothe number of the aperture sub-portions 311. The second functionalportion 1142 includes at least two second functional sub-layers 11421,and a number of the second functional sub-layers 11421 is equal to thenumber of the aperture sub-portions 311.

In this case, the abovementioned step S21 of covering the first region151 of the substrate 15 using the second shielding portion 322 a of thefirst mask 301 and exposing the second region 152 of the substrate 15from the aperture portion 31 a of the first mask 301 includes thefollowing step.

The second shielding sub-portions 3221 a of the first mask 301 arealigned with the first sub-regions 1511 of the substrate 15 inone-to-one correspondence, and the aperture sub-portions 311 a of thefirst mask 301 are aligned with the second sub-regions 1521 of thesubstrate 15 in one-to-one correspondence.

The abovementioned step S22 of forming the first functional portion 1141on the side of the substrate 15 by vapor deposition through the apertureportion 31 a of the first mask 301 includes the following step.

A plurality of first function sub-layers 11411 is formed on the side ofthe substrate 12 through a plurality of aperture sub-portions 311 a ofthe first mask 301, such that each first function sub-layer 11411 coversa corresponding second sub-region 1521.

The abovementioned step S23 of covering the through hole 150 of thesubstrate 15 using the first shielding portion 321 b of the second mask302, covering the second region 152 of the substrate 15 using the secondshielding portion 322 b of the second mask 302 and exposing the firstregion 151 of the substrate 15 from the aperture portion 31 b of thesecond mask 302 includes the following step.

The position of the first mask 301 relative to the substrate 15 isadjusted in such a manner that the second shielding sub-portions 3221 aof the first mask 301 are aligned with the second sub-regions 1521 ofthe substrate 15, and the aperture sub-portions 311 a of the first mask301 are aligned with the first sub-regions 1511 of the substrate 15.

The abovementioned step S24 of forming the second functional portion1142 on the side of the substrate 15 by vapor deposition through theaperture portion 31 b of the second mask 302 includes the followingstep.

The second function sub-layer 11421 is formed on the side of thesubstrate 15 by vapor deposition through the position-adjusted aperturesub-portion 311 a of the first mask 301 having its position adjusted,such that each second function sub-layer 11421 covers a respective firstsub-region 1511.

It is merely an example in FIG. 20 that the through hole 150 and theouter contour of the display region 10 are shaped as circles. In fact,the through hole 150 and the outer contour of the display region 10 mayalso be shaped as equilaterals, such as squares, equilateral trianglesand the like. The manufacturing method is the same as the manufacturingmethod as described above in which the through hole 150 and the outercontour of the display region 10 are shaped as circles, and detailsthereof will not be further described herein.

Therefore, in this embodiment of the present disclosure, when thethrough hole 150 and the outer contour of the substrate 15 are bothshaped as circles or equilaterals, and the geometric center of thethrough hole 150 coincides with the geometric center of the substrate15, the first mask 301 can be used as the second mask 302 by onlyadjusting the position of the first mask 301. In this way, thefunctional layer 114 can be formed by performing vapor deposition twicethrough a mask of only one mask, thereby reducing masks and thusreducing the manufacturing cost of the display panel.

FIG. 21 is a schematic diagram of yet still another mask according to anembodiment of the present disclosure, and FIG. 22 is a schematicstructural flowchart of yet still another method for manufacturing adisplay panel according to an embodiment of the present disclosure. Inan embodiment, as shown in FIG. 21 and FIG. 22, the through hole 150 andthe outer contour of the substrate 15 are both shaped as axisymmetricpatterns, and the symmetry axis of the through hole 150 coincides withthe symmetry axis of the substrate 15. The second shielding portion 322a of the first mask 301 has a same shape as the aperture portion 31 b ofthe second mask 302, and the aperture portion 31 a of the first mask 301has a same shape as the second shielding portion 322 b of the secondmask 302.

In this case, the abovementioned step S23 of covering the through hole150 of the substrate 15 using the first shielding portion 321 a of thesecond mask 302, covering the second region 152 of the substrate 15using the second shielding portion 322 b of the second mask 302 andexposing the first region 151 of the substrate 15 from the apertureportion 31 b of the second mask 302, and the abovementioned step S24 offorming the second functional portion 1142 on the side of the substrate15 by vapor deposition through the aperture portion 31 b of the secondmask 302 include the following steps.

The substrate 15 is fixed, and the first mask 301 is rotated by 180°about the symmetry axis of the substrate or is rotated by 180° about acenter point of the symmetry axis of the substrate in a plane of thefirst mask, such that the first shielding portion 321 a of the firstmask 301 covers the through hole 150 of the substrate 15, a secondshielding portion 322 b of the first mask 301 covers the second region1521 of the substrate 15, and the aperture portion 31 a of the firstmask 301 exposes the first region 151 of the substrate 15. Then, asecond functional portion 1142 is formed on the side of the substrate 15by vapor deposition through the aperture portion 31 a of the second mask301.

That is, in this embodiment of the present disclosure, when the throughhole 150 and the outer contour of the substrate 15 are both shaped asaxisymmetric patterns, and the symmetry axis of the through hole 150coincides with the symmetry axis of the substrate 15, the first mask 301can be used as the second mask 302 by only rotating the first mask 301about the symmetry axis or only rotating the first mask 301 about acenter point of the symmetry axis in a plane of the first mask 301. Inthis way, the functional layer 114 can be formed by performing vapordeposition twice through a mask of only one pattern, thereby reducingmasks and thus reducing the manufacturing cost of the display panel.

The above description is merely an example of a method for manufacturinga display panel, in which each mask includes a part of the shieldingportion having the same shape and the same area as that of the throughhole 150. Actually, the shape of the mask is not limited thereto. Forexample, as shown in FIG. 8, FIG. 23 and FIG. 24, in which FIG. 23 is aschematic flowchart of still another method for fabricating a displaypanel according to an embodiment of the present disclosure and FIG. 24is a schematic structural flowchart of the method of FIG. 23, the maskmay also be designed as a shape as shown in FIG. 8. Here, the masksinclude a first mask 301 and a second mask 302. The first mask 301includes an aperture portion 31 a and a shielding portion 32 a, and thesecond mask 302 includes an aperture portion 31 b and a shieldingportion 32 b. The shielding portion 32 a of the first mask 301 has anarea larger than that of the through hole 150. The second mask 302 has asame shape and a same area as the shielding portion 32 a of first mask301. The shielding portion 32 b of the second mask 302 has a same shapeand a same area as the through hole 150. Moreover, the shielding portion32 a of the first mask 301 extends from the edge of the first mask 301into the first mask 301. The shielding portion 32 b of the second mask302 extends from the edge of the second mask 302 into the second mask302.

In this case, the abovementioned step S2 of forming the first functionalportion 1141 and the second functional portion 1152 on the side of thesubstrate 15 by vapor deposition through the aperture portions of themasks includes the following steps.

At S21, the through hole 150 of the substrate 15 is covered using theshielding portion 32 a of a first mask 301, and the second region 152 ofthe substrate 15 is covered using the aperture portion 31 a of the firstmask 301.

At S22, the first functional portion 1141 is formed on the side of thesubstrate 15 by vapor deposition through the aperture portion 31 a ofthe first mask 301.

At S23, the shielding portion 32 b of the second mask 302 is alignedwith the through hole 150 of the substrate 15, and the aperture portion31 a of the second mask 302 is aligned with the first region 151 of thesubstrate 15.

At S24, the second functional portion 1142 is formed on the side of thesubstrate 15 by vapor deposition through the aperture portion 31 b ofthe second mask 302.

The abovementioned manufacturing method is not only applied to a displaypanel including a hollow region provided with a through hole 150, butalso applied to a flexible display panel. For example, as shown in FIG.25, which is a perspective view of another display panel according to anembodiment of the present disclosure, the substrate 15 may be in acurved shape. In this case, the above-described method for manufacturingthe display panel may be applied to perform vapor deposition on thecurved substrate 15, so as to form the curved display panel as shown inFIG. 25. As an example, FIG. 25 illustrates a functional layer 114 on adisplay panel after one vapor deposition.

An embodiment of the present disclosure further provides a maskincluding an aperture portion and a shielding portion, and the shieldingportion extends from an edge of the mask into the mask.

In this embodiment of the present disclosure, at least one mask isarranged in the above manner, such that when manufacturing the displaypanel using the mask, functional layers covering the entire displayregion can be sequentially manufactured by at least two vapor depositionprocesses. Moreover, since the shielding portion of the mask extendsfrom the edge of the mask into the mask, when manufacturing the displaypanel including the hollow region, it is not necessary to performcutting and the like operation on the hollow region of the displaypanel. As a result, cutting residues can be avoided, and thus reliablepackaging of the display panel can be achieved. Moreover, since theshielding portion of the mask extends from the edge of the mask into themask, there is no need to provide a support pillar for the mask tosupport the shielding portion. In this way, the influence on vapordeposition of the display region can be avoided, and the problem thatthe position other than the hollow region cannot be vapor-deposited canbe avoided, thereby improving the display effect of the display panel.

In an example, as shown in FIG. 5, which is a schematic diagram of amask according to an embodiment of the present disclosure, the maskincludes a first mask 301 and a first a second mask 302. The first mask301 includes an aperture portion 31 a and at least one shielding portion32 a, and the at least one shielding portion 32 a includes a firstshielding portion 321 a and a second shielding portion 322 a that isconnected to the first shielding portion 321 a. The second mask 302includes an aperture portion 31 b and at least one shielding portion 32b, and the at least one shielding portion 32 b includes a firstshielding portion 321 b and a second shielding portion 322 b that isconnected to the first shielding portion 321 b. The first shieldingportion 321 a of the first mask 301 has a same shape and a same area asthe first shielding portion 321 b of the second mask 302. The secondshielding portion 322 a of the first mask 301 extends from the edge ofthe first mask 301 into the first mask 301, and the second shieldingportion 322 b of the second mask 302 extends from the edge of the secondmask 302 into the second mask 302. The second shielding portion 322 a ofthe first mask 301 has a same shape and a same area as the apertureportion 31 b of the second mask 302, and the aperture portion 31 a ofthe first mask 301 has a same shape and a same area as the secondshielding portion 322 b of the second mask 302.

In an example, as shown in FIG. 16, which is a schematic diagram of yetstill another mask according to an embodiment of the present disclosure,the first mask 301, the second mask 302, the first shielding portion 321a of the first mask 301 and the first shielding portion 321 b of thesecond mask 302 are shaped as central symmetrical patterns. The symmetrycenter of the first shielding portion 321 a of the first mask 301coincides with the symmetry center of the first mask 301. The symmetrycenter of the first shielding portion 321 b of the second mask 302coincides with the symmetry center of the second mask 302.

In an example, as shown in FIG. 19, which is another schematic diagramof a first mask according to an embodiment of the present disclosure,the first mask 301, the second mask 302, the first shielding portion 321a of the first mask 301 and the first shielding portion 321 b of thesecond mask 302 each are shaped as a circle or an equilateral. Ageometrical center of the first shielding portion 321 a of the firstmask 301 coincides with a geometric center of the first mask 301. Ageometric center of the first shielding portion 321 b of the second mask302 coincides with a geometric center of the second mask 302. The secondshielding portion 322 a of the first mask 301 includes at least twosecond shielding sub-portions 3221 a. The aperture portion 31 a of thefirst mask 301 includes at least two aperture sub-portions 311 a. Thenumber of the aperture sub-portions 311 a is equal to the number of thesecond shielding sub-portions 3221 a. The second shielding sub-portions3221 a and the aperture sub-portions 311 a are alternately arranged.Each second shielding sub-portion 3221 a of the first mask 301 extendsfrom the edge of the first mask 301 into the first mask 301.

In another example, as shown in FIG. 21, which is a schematic diagram ofyet still another mask according to an embodiment of the presentdisclosure, the first mask 301, the second mask 302, the first shieldingportion 321 a of the first mask 301 and the first shielding portion 321b of the second mask 302 are shaped as axisymmetric patterns. Thesymmetry axis of the first shielding portion 321 a of the mask 301coincides with the symmetry axis of the first mask 301, and the symmetryaxis of the first shielding portion 321 b of the second mask 302coincides with the symmetry axis of the second mask 302.

In an example, as shown in FIG. 8, which is a schematic diagram ofanother mask according to an embodiment of the present disclosure, themask includes a first mask 301 and a second mask 302. The first mask 301includes an aperture portion 31 a and a shielding portion 32 a. Thesecond mask 302 includes an aperture portion 31 b and a shieldingportion 32 b. The second mask 302 has a same shape and a same area asthe shielding portion 32 a of the first mask 301. The shielding portion32 a of the first mask 301 has an area larger than that of the shieldingportion 32 b of the second mask 302. The shielding portion 32 a of thefirst mask 301 extends from the edge of the first mask 301 into thefirst mask 301, and the shielding portion 32 b of the second mask 302extends from the edge of the second mask 302 into the second mask 302.

The use of the abovementioned various types of masks is the same as thatused in the abovementioned manufacturing method for the display panel,and details thereof will not be further described herein.

An embodiment of the present disclosure further provides a displaydevice. As shown in FIG. 26, which is a schematic diagram of a displaydevice according to an embodiment of the present disclosure, the displaydevice includes the display panel 100 described above, and the displaypanel 100 includes a hollow region 20. The structure of the displaypanel 100 has been described in details in the above embodiments, anddetails thereof will not be further described herein. It should be notedthat the display device shown in FIG. 24 is merely illustrative, and thedisplay device can be any electronic device having a display function,such as a watch, a billboard or the like.

For the display device provided in this embodiment, an uneven portion1140 is provided in a functional layer 114 of a display panelconstituting the display device, such that when manufacturing thedisplay panel, the display region 10 of the display panel can be dividedinto at least two parts. Here, each part of the divided display region10 extends from an edge of the display panel into the display panel.Then, the first mask 301 and the second mask 302 as shown in FIG. 5 areused to form the functional layer 114 covering the entire display region10 by at least two vapor deposition processes. Here, the shapes of thefirst mask 301 and the second mask 302 are in one-to-one correspondencewith the respective shapes of the plurality of parts into which thedisplay region 10 is divided. That is, the shielding portions of thefirst mask 301 and the second mask 302 each extend from the respectiveedge into a respective one of the first mask 301 and the second mask302. In this way, when manufacturing the display panel including thehollow region 20, it is not necessary to perform cutting and the likeoperation on the hollow region 20 of the display panel. As a result,cutting residues can be avoided, and thus reliable packaging of thedisplay panel can be achieved. Moreover, since the shielding portions ofthe first mask 301 and the second mask 302 each extend from therespective edge into a respective one of the first mask and the secondmask, there is no need to provide a support pillar for the first mask301 or the second mask 302 to support the shielding portion. In thisway, the influence on vapor deposition of the display region 10 can beavoided, and the problem that the position other than the hollow region20 cannot be vapor-deposited can be avoided, thereby improving thedisplay effect of the display panel.

What is claimed is:
 1. A method for manufacturing a display panel,comprising: providing a substrate and at least one mask, wherein thesubstrate has a first region and a second region, a projection of thefirst region on a plane of the substrate does not overlap with aprojection of the second region on the plane of the substrate, the firstregion and the second region each extend from an edge of the substrateinto the substrate, each of the at least one mask comprises an apertureportion and a shielding portion, and the at least one shielding portionextends from an edge of the mask into the mask; and forming a functionallayer on a side of the substrate sequentially by vapor depositionthrough the aperture portion of the at least one mask, wherein thefunctional layer comprises a first functional portion, a secondfunctional portion, and an uneven portion, and the first functionalportion and the second functional portion are respectively located ontwo sides of the uneven portion, wherein the first functional portioncovers the second region, the second functional portion covers the firstregion, and the first functional portion and the second functionalportion are arranged in a same layer.
 2. The method according to claim1, wherein the substrate has a hollow region, and a through hole isprovided in the hollow region; and wherein the first functional portionand/or the second functional portion are not formed at the through hole.3. The method according to claim 2, wherein the at least one maskcomprises a first mask and a second mask; the first mask and the secondmask each comprise an aperture portion and at least one shieldingportion, the at least one shielding portion comprises a first shieldingportion and a second shielding portion connected to the first shieldingportion; the first shielding portion of the first mask and the firstshielding portion of the second mask have a same shape and a same areaas the through hole; the second shielding portion of the first maskextends from an edge of the first mask into the first mask, the secondshielding portion of the second mask extends from an edge of the secondmask into the second mask; the second shielding portion of the firstmask has a same shape as the aperture portion of the second mask, andthe aperture portion of the first mask has a same shape as the secondshielding portion of the second mask; wherein forming the firstfunctional portion and the second functional portion on the side of thesubstrate sequentially by vapor deposition through the aperture portionof the at least one mask comprises: covering the through hole of thesubstrate using the first shielding portion of the first mask, coveringthe first region of the substrate using the second shielding portion ofthe first mask, and exposing the second region of the substrate from theaperture portion of the first mask; forming the first functional portionon the side of the substrate by vapor deposition through the apertureportion of the first mask; covering the through hole of the substrateusing the first shielding portion of the second mask, covering thesecond region of the substrate using the second shielding portion of thesecond mask, and exposing the first region of the substrate from theaperture portion of the second mask; and forming the second functionalportion on the side of the substrate by vapor deposition through theaperture portion of the second mask.
 4. The method according to claim 3,wherein the through hole and an outer contour of the substrate are bothshaped as central symmetrical patterns, and a symmetry center of thethrough hole coincides with a symmetry center of the substrate; whereinsaid covering the through hole of the substrate using the firstshielding portion of the second mask, covering the second region of thesubstrate using the second shielding portion of the second mask, andexposing the first region of the substrate using the aperture portion ofthe second mask comprises: adjusting a position of the first maskrelative to the substrate in such a manner that the first shieldingportion of the first mask covers the through hole of the substrate, thesecond shielding portion of the first mask covers the second region ofthe substrate, and the aperture portion of the first mask exposes thefirst region of the substrate, and wherein said forming the secondfunctional portion on the side of the substrate by vapor depositionthrough the aperture portion of the second mask comprises: forming thesecond functional portion on the side of the substrate by vapordeposition through the aperture portion of the first mask having itsposition adjusted.
 5. The method according to claim 4, wherein saidadjusting the position of the first mask relative to the substratecomprises: fixing the first mask and rotating the substrate by 180°about the symmetry center of the substrate; or fixing the substrate androtating the first mask by 180° about the symmetry center of thesubstrate.
 6. The method according to claim 3, wherein the through holeand an outer contour of the substrate are both shaped as circles orequilaterals, and a geometric center of the through hole coincides witha geometric center of the substrate; the second shielding portion of thefirst mask comprises at least two second shielding sub-portions, and theaperture portion of the first mask comprises at least two aperturesub-portions; a number of the at least two aperture sub-portions isequal to a number of the at least two second shielding sub-portions; theat least two second shielding sub-portions and the at least two aperturesub-portions are alternately arranged; and each of the at least twosecond shielding sub-portions of the first mask extends from the edge ofthe first mask into the first mask; the first region of the substratecomprises at least two first sub-regions, and the second region of thesubstrate comprises at least two second sub-regions; a number of the atleast two first sub-regions is equal to a number of the at least twosecond sub-regions, the number of the at least two first sub-regions isequal to the number of the at least two aperture sub-portions; and theat least two first sub-regions and the at least two second sub-regionsare alternately arranged; the first functional portion comprises atleast two first function sub-layers, and a number of the at least twofirst function sub-layers is equal to the number of the at least twoaperture sub-portions; the second functional portion comprises at leasttwo second function sub-layers, and a number of the at least two secondfunction sub-layers is equal to the number of the at least two aperturesub-portions; wherein said covering the first region of the substrateusing the second shielding portion of the first mask and exposing thesecond region of the substrate from the aperture portion of the firstmask comprises: aligning the at least two second shielding sub-portionsof the first mask with the at least two first sub-regions of thesubstrate in one-to-one correspondence, and aligning the at least twoaperture sub-portions of the first mask with the at least two secondsub-regions of the substrate in one-to-one correspondence; wherein saidforming the first functional portion on the side of the substrate byvapor deposition through the aperture portion of the first maskcomprises: forming the at least two first function sub-layers on theside of the substrate by vapor deposition through the at least twoaperture sub-portions of the first mask, such that each of the at leasttwo first function sub-layers covers a respective second sub-region ofthe at least two second sub-regions; wherein said covering the throughhole of the substrate using the first shielding portion of the secondmask, covering the second region of the substrate using the secondshielding portion of the second mask, and exposing the first region ofthe substrate from the aperture portion of the second mask comprises:adjusting a position of the first mask relative to the substrate in sucha manner that the at least two second shielding sub-portions of thefirst mask are aligned with the at least two second sub-regions of thesubstrate, and the at least two aperture sub-portions of the first maskare aligned with the at least two first sub-regions of the substrate;wherein said forming the second functional portion on the side of thesubstrate by vapor deposition through the aperture portion of the secondmask comprises: forming the at least two second function sub-layers onthe side of the substrate by vapor deposition through the at least twoaperture sub-portions of the first mask having its position adjusted,such that each of the at least two second function sub-layers covers arespective first sub-region of the at least two first sub-regions. 7.The method according to claim 3, wherein the through hole and an outercontour of the substrate are both shaped as axisymmetric patterns, and asymmetry axis of the through hole coincides with a symmetry axis of thesubstrate; wherein said covering the through hole of the substrate usingthe first shielding portion of the second mask, covering the secondregion of the substrate using the second shielding portion of the secondmask, and exposing the first region of the substrate using the apertureportion of the second mask comprises: fixing the substrate, and rotatingthe first mask by 180° about the symmetry axis of the substrate orrotating the first mask by 180° about a center point of the symmetryaxis of the substrate in a plane of the first mask, such that the firstshielding portion of the first mask covers the through hole of thesubstrate, the second shielding portion of the first mask covers thesecond region of the substrate, and the aperture portion of the firstmask exposes the first region of the substrate; wherein forming thesecond functional portion on the side of the substrate by vapordeposition through the aperture portion of the second mask comprises:forming the second function layer on the side of the substrate by vapordeposition through the aperture portion of the rotated first mask. 8.The method according to claim 2, wherein the at least one mask comprisesa first mask and a second mask; the first mask and the second mask eachcomprise an aperture portion and a shielding portion, the shieldingportion of the first mask has an area larger than that of the throughhole, the second mask has a same shape and a same area as the shieldingportion of the first mask, the shielding portion of the second mask hasa same shape and a same area as the through hole; the shielding portionof the first mask extends from an edge of the first mask into the firstmask, and the shielding portion of the second mask extends from an edgeof the second mask into the second mask; wherein forming the firstfunctional portion and the second functional portion on the side of thesubstrate sequentially by vapor deposition through the aperture portionof the at least one mask comprises: covering the through hole of thesubstrate using the shielding portion of the first mask, and exposingthe second region of the substrate from the aperture portion of thefirst mask; and forming the first functional portion on the side of thesubstrate by vapor deposition through the aperture portion of the firstmask; and aligning the shielding portion of the second mask with thethrough hole of the substrate, and aligning the aperture portion of thesecond mask with the first region of the substrate; and forming thesecond functional portion on the side of the substrate by vapordeposition through the aperture portion of the second mask.